碲化镓GaTe

货号:10646 编号:MK646

CAS号:12024-14-5 规格:

包装:原包装进口,真空包装 保质期:密封保存6个月+

保存条件:真空密封保存

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货号:10646 编号:MK646

CAS号:12024-14-5 规格:

包装:原包装进口,真空包装 保质期:密封保存6个月+

保存条件:真空密封保存

请选择规格参数

  • 尺 寸 : ~ 2-4 mm
购买数量

                         

样品名称碲化镓GaTe(Gallium Telluride)单晶
性质半导体
带隙块体间接带隙1.65 eV,单层直接带隙直接带隙2.0 eV
参数

1.尺寸 ~10mm,纯度高纯制备方法:区域熔

2.尺寸2-4mm,纯度高纯制备方法:CVT

应用半导体电子器件,传感器-探测器,光学器件等研究
其他信息

详情请发邮件至:mknano@126.com。

 合成GaTe晶体照片:


XRD:

Raman:

PL:

HRTEM:

Product Description

     Our single crystal monoclinic GaTe (Gallium telluride) crystals come with guaranteed  anisotropy, electronic, and optical grade crystal quality. They are developed at our facilities using three different growth techniques, namely Bridgman growth, chemical vapor transport (CVT), and flux zone growth, to optimize grain sizes and reduce defect concentrations. In contrast to commonly used chemical vapor transport (CVT) technique, flux grown crystals are well known for their structural perfection and electronic/optical performance. Bridgman and flux zone methods both offer similar grade qualities. Each crystal very large in size to last for years, is highly crystalline, oriented in 0001 direction, and easy to exfoliate. Our R&D staff takes characterization dataset in each sample piece to ensure structural, optical, and electronic consistency. 


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