薄膜照片：

单层薄膜照片：

多层薄膜照片：

二维材料连续薄膜PL光谱：

MoS₂薄膜PL：

WS2薄膜PL：

MoSe2薄膜PL：

WSe2薄膜PL：

Product Description:

   2 inch full area coverage MoS2, MoSe2, WS2, WSe2 monolayers (few-layers are available on request) on 2 inch size c-cut sapphire substrates. CVD TMDs are all highly luminescent and Raman spectroscopy studies also confirm the monolayer thickness.

Growth method: Our company synthesizes these monolayers using chemical vapor deposition (CVD) using highest purity (6N) gases and precursors in semiconductor grade facilities to produce crystalline and large domain size samples (1-50um). This is unlike commonly used MOCVD process wherein defects are very very large and domain sizes are small (10nm-500nm). Our samples are always highly luminescent, highly crystallized and does not contain carbon contaminant layer

Sample Properties

Specification.

• Identification. Full coverage 100% monolayer (few-layers are available on request) uniformly covered across c-cut sapphire
• Physical dimensions. World's largest size 2'' diameter monolayers on sapphire.
• Smoothness. Atomically smooth surface with roughness < 0.15 nm.
• Uniformity. Highly uniform surface morphology. TMDs monolayers (few-layers are available on request) uniformly cover across the sample.
• Purity. 99.9995% purity as determined by nano-SIMS measurements
• Reliability. Repeatable Raman and photoluminescence response
• Crystallinity. High crystalline quality, Raman response, and photoluminescence emission comparable to single crystalline sheets.
• Substrate. c-cut Sapphire
• Support. 2Dsemiconductors USA is an American owned, regulated, and operated company. Our customers are well-protected by international as well as strict American customer laws and regulations. We give full technical support and guarantee your satisfaction with our well-established customer service
• Defect profile. TMDs monolayers do not contain intentional dopants or defects. However, our technical staff can produce defected TMDs using a-bombardment technique.