进口二维半导体单晶>硫化砷锑SbAsS3单晶
 
硫化砷锑SbAsS3晶体
 
货号: 100814 规格:
CAS号: 保质期: 密封保存6个月+
编号: MK1014 保存条件: 真空密封保存
包装: 原包装进口
价格:
现货库存32
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货号 编号 参数 库存 价格
100814 MK1014 5-8 mm 100 登录查看

           

 样品名称 硫化砷锑SbAsS3晶体
 性质 半导体
带隙 ~1.7 eV
 参数

 尺寸:~ 5-8 mm 

 应用 半导体电子器件,传感器-探测器,非线性光学,STM-AFM实验,光学器件等研究
 其他信息

 详情请发邮件至mknano@126.com。

硫化砷锑SbAsS3晶体照片:


Product Description

Our newest class of material: Sb2xAs2(1-x)S3 comes in perfect 1:1:3 stoichiometry consisting of Sb-Sb-S3 atoms. After 34 growth trials in a year, perfect stoichirometry, large single crystal domain size, minimal defect density (1 parts in 100,000 unit cells), and perfected purity level (99.9998%) are achieved. In the bulk form, antimony arsenic sulfide (SbAsS?) is a direct gap semiconductor and has band-gap at around 1.7 eV. Similar to molybdenum disulfide, it has layered structure (lamellar) with weak interlayer coupling and can be isolated down to monolayers. The monolayer thickness measures ~0.8 nm and the monolayer SbAsS? is waiting to be discovered both experimentally and theoretically. Our crystals are large in size ~5-8mm and show remarkable PL characteristics.

 

Our crystals are grown by state-of-the-art growth techniques over 8 weeks and show high crystallinity. Raman spectrum displays very sharp and clear modes with FWHM less than 6cm-1. Single crystal SbAsS3 comes ready for exfoliation and is ideal for 2D research.


Summary: 
Sb
2xAs2(1-x)S3 alloys are created by alloying Sb into As2S3.

Please specify your x value when ordering

Space group: P21/c

Layered: Yes / Exfoliates to monolayers

Band gap: ~1.7 eV in bulk

Purity: Semiconductor grade (6N) 99.9999%

Growth technique: Vapor transport technique – Duration: 2.0 months

Sample size: 5-10 mm


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